Vacuum Pump Inlet Traps for ALD Extract Particulates and Absorb Unreacted Precursors

26.09.2024
A full line of vacuum inlet traps for ALD (Atomic Layer Deposition) processes from research in small laboratories to large production systems has been introduced by Mass-Vac, Inc.
Vacuum Pump Inlet Traps for ALD Extract Particulates and Absorb Unreacted Precursors

VACUUM PUMP INLET TRAPS FOR ALD

MV Vacuum Inlet Traps for ALD processes can be easily customized by the user to remove all process byproducts from precursors such as TMA, TiCl, DeZ, and H2S including particulates and unreacted precursors. Available for both research and production applications, they come in sizes ranging from 4” to 16” dia. with port sizes from NW-25 to ISO-160 for protecting vacuum pumps and lines with flow rates from 25 to 2000 CFM.

Featuring interchangeable filter elements, MV Vacuum Inlet Traps for ALD processes are made of stainless steel and include the PosiTrap in 4” and 8” dia. sizes and the MultiTrap in 12” and 16”. Filters include stainless steel gauze for particles, activated charcoal for unreacted precursor adsorption, Sodasorb for acid neutralization, Sulfatreat for H2S neutralization, and Ammoiniasorb for NH3 and Amines.

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