Drypump For 300 mm LPCVD Nitride Processes


The iH1800HTX drypump, on display for the first time at SEMICON® West 2003 by BOC Edwards, further enhances the line of 300 mm process pumps currently offered by this leading semiconductor materials, equipment and services company.

The iH1800HTX pump is designed specifically for high throughput LPCVD nitride and other harsh 300 mm and flat panel display processes. Formation of condensing process byproducts is reduced inside the pump, providing longer service life and enables greater tool availability for wafer processing. Based on the proven iH series of drypumps, the iH1800HTX delivers 1800 m3/hr performance and operates at high temperatures to minimize byproduct build-up.

This is accomplished by optimizing the operating temperature of the pump, providing increased dilution capacity, and integrating an enlarged and heated pump exhaust line. The iH1800HTX is recommended by many process tool manufacturers for use on 300 mm LPCVD nitride platforms. BOC Edwards iH1800 series pumps have an outstanding performance record in other 300 mm environments such as stripping/ashing, diffusion, and other CVD processes.

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