“We are pleased to present important new vacuum solutions at the trade fairs Semicon Korea and Semicon China. In an increasingly changing competitive environment, Pfeiffer Vacuum is ideally set up as a rock-solid company, acting in the global arena as a reliable, long-term allround provider of vacuum technology for customers all over the world“, says Eric Taberlet, President of the Business Unit Semiconductor & Coating.
A4 series of dry pumps
The dry, multi-stage Roots pumps in the A4 series provide pumping speeds of 100 to 2,300 m3/h. These energy-efficient and reliable pumps are ideal for use in demanding processes in the semiconductor and coating industries. With corrosion resistant materials and a high gas throughput, this pump series is optimally suited for use in CVD processes, for example.
Turbopump HiPace 2800 IT
With the HiPace 2800 IT Pfeiffer Vacuum presents a turbopump especially dedicated for ion implantation applications. The sophisticated rotor design of the turbopump results in an optimized pumping speed for light gases. This ensures very good process adaption for ion implantation processes, were hydrogen is the most accumulating gas. With 2,750 l/s pumping speed for hydrogen the new HiPace 2800 IT is the best turbopump in its class.
The intelligent temperature management system prevents process condensation and deposition inside the pumping system. It allows setting the temperature individually to ideally support the process. The special coating of the rotor ensures robustness against all ion implantation process materials. Being based on a so-called hybrid bearing, a combination of ceramic ball bearings on the fore-vacuum side and permanently magnetic radial bearings on the high vacuum side, these HiPace turbopumps have a particularly robust bearing design. Together with the efficient coating, this forms the basis for the long life cycle and maximum up-time of the pumps.
Magnetically levitated turbopumps ATH 2804 M and ATH 3204 M
The ATH-M pumps offer a gas throughput of over 5,000 sccm of nitrogen for nonheated applications. They also allow a very high throughput with up to 1,500 sccm of argon and a pump operating temperature of 65 °C in corrosive applications. The pumps operate at high temperatures up to 85 °C for use in the most aggressive applications with by-product deposition sensitive processes. These pumps include integrated drive electronics to ensure a small footprint and easy plug-and-play installation. The total height of the DN 320 flange model is less than 400 mm. Due to the new electronics, the pumps can be started and stopped within 8 minutes. Active magnetically levitated bearings and automatic out-of-balance compensation enable wear-free and low vibration operation of the ATH-M pumps. They are maintenancefree and require no lubrication. Continuous rotor stability is assured for reliable performance. Low power consumption at nominal speed and very low cooling water consumption (1 l/min) also characterize the new ATH-M pumps.
Picture: Turbopump HiPace 2800 IT from Pfeiffer Vacuum (Image: Pfeiffer Vacuum GmbH)
Quelle: Pfeiffer Vacuum GmbH