Opening Day Snow Storm Didn’t Dampen Success of the 2013 Chem Show


Despite a snow storm that hit New York City and the surrounding region on December 10, the opening day of the 2013 Chem Show, the 55th biennial event attracted more than 5,500 registered chemical processing industry (CPI) professionals to North America’s leading processing exposition.

Opening Day Snow Storm Didn’t Dampen Success of the 2013 Chem Show

Chem Show

According to Clay Stevens, President of International Exposition Company, which produces and manages the Chem Show, these statistics represent a 4.7% increase over the number of visitors who attended the last Chem Show in 2011. “Overall attendance, which includes exhibitor personnel and other attendees, was almost identical to 2011,” Stevens said. “However, a nearly 5% increase in visitor attendance is quite impressive when you consider how the opening-day snow storm could have impacted attendance.”

Stevens added that many of the nearly 300 companies participating in the Show reported that they were pleased with the quality and number of decision-makers who visited their booths looking for innovative solutions. “There was a wealth of consistently good quality visitors to our booth,” said Tom O’Banion, Director – Global Chemical Industry, Micro Motion, Inc. “The decision makers from the big companies were here.”

This assessment was echoed by Chris Kesselring, Chemical-Petrochemical & Refinery Sales Manager, BS&B, who said, “This was a tremendous Show for us as we received several very good quality leads that will be turned into sales. We are looking forward to the 2015 CHEM SHOW if it is anything like this year’s event.”

The 2015 Chem Show will mark the 100th Anniversary of the venerable biennial event, which will be held December 8th –10th at the Javits Convention Center in New York City.

“We believe the 100th Anniversary of the Chem Show is a great opportunity to bring all segments of the chemical process industries together to envision what the next 100 years will look like,” Stevens stated.

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